Activation energy in metal-containing DLC films with various metals of various concentrations

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1669-1673

  Takeno, Takanori ^a   Hoshi, Yuhtaro ^a   Miki, Hiroyuki ^a   Takagi, Toshiyuki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Activation energy; DLC; Metal

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ARCHITECTURAL ACOUSTICS; CARBON CLUSTERS; CARBON FILMS; CHEMICAL ACTIVATION; CHLORINE COMPOUNDS; COBALT; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELECTRIC LOAD MANAGEMENT; LITHOGRAPHY; METALS; METHANE; MOLYBDENUM; NONMETALS; PLASMA DIAGNOSTICS; SILICON; STRUCTURAL METALS; TEMPERATURE DISTRIBUTION; TRANSMISSION ELECTRON MICROSCOPY;

CO-SPUTTERING; DLC; DLC FILMS; GRANULAR FILMS; INSULATING MATRICES; METAL; METAL CLUSTERS; METAL CONCENTRATIONS; METAL TARGETS; METHANE PLASMA; RADIO FREQUENCIES; SILICON SUBSTRATES; TEMPERATURE DEPENDENCES; TRANSMISSION ELECTRON MICROSCOPE;

ACTIVATION ENERGY;

EID: 48849086420     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.03.039     Document Type: Article

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