Precipitation and characterization of chelerythrine microparticles by the supercritical antisolvent process

Chemical Engineering and Technology

Volumn 31, Issue 7, 2008, Pages 1051-1055

  Hong, Hailong ^a   Suo, Quanling ^a   Li, Fawang ^a,c   Wei, Xionghui ^b   Zhang, Jianbin ^b  

^a INNER MONGOLIA UNIVERSITY OF TECHNOLOGY   (China)

^b PEKING UNIVERSITY   (China)

^c Inner Mongolia Chemical Engineering Professional College   (China)

Author keywords

Chelerythrine; Microparticles; Precipitation; SEDS PA; Supercritical fluids

Indexed keywords

CARBON DIOXIDE; METHANOL; NANOSTRUCTURED MATERIALS;

CHELERYTHRINE; M ETHANOL SOLUTION; MICROPARTICLES; PRECIPITATION; SEDS-PA; SUPERCRITICAL ANTISOLVENT PROCESS; SUPERCRITICAL CARBON DIOXIDE; SUPERCRITICAL FLUIDS;

SUPERCRITICAL FLUID EXTRACTION;

EID: 48649107665     PISSN: 09307516     EISSN: 15214125     Source Type: Journal    
DOI: 10.1002/ceat.200800114     Document Type: Article

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