Surfactant-controlled etching of ion track nanopores and its practical applications in membrane technology

Radiation Measurements

Volumn 43, Issue SUPPL.1, 2008, Pages

  Apel, P Yu ^a   Blonskaya, I V ^a   Dmitriev, S N ^a   Mamonova, T I ^a   Orelovitch, O L ^a   Sartowska, B ^b   Yamauchi, Yu ^a  

^a JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^b INSTITUTE OF NUCLEAR CHEMISTRY AND TECHNOLOGY   (Poland)

Author keywords

Adsorption; Chemical etching; Ion tracks; Membranes; Microfiltration; Micropores; Nanopores; Polymers; Self assembly; Surfactant; Ultrafiltration

Indexed keywords

CHEMICAL PROPERTIES; ETCHING; IONS; NANOPORES; OPTICAL DESIGN; PHOTORESISTS; PLASTIC PRODUCTS; POLYMERS; SELF ASSEMBLY; SURFACE ACTIVE AGENTS; THERMOPLASTICS; VEHICULAR TUNNELS;

ACTIVE AGENTS; ALKALINE ETCHING; ASYMMETRIC MEMBRANES; CHEMICAL DEVELOPMENT; CHEMICAL ETCHANTS; ETCH RATES; ETCHED PORES; ETCHING TIME; HYDROXIDE IONS; ION TRACKS; MEMBRANE TECHNOLOGIES; MICRO-PORES; PERMEATION PROPERTIES; POLYETHYLENE TEREPHTHALATE (PET); POLYMER SURFACES; PORE DIAMETERS; PORE SHAPES; PORE SURFACES; PORE VOLUME (PV); SELF-ASSEMBLY; SURFACTANT MOLECULES; TRACK MEMBRANES;

NANOSTRUCTURED MATERIALS;

EID: 48549096627     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2008.04.057     Document Type: Article

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