Surfactant-enhanced control of track-etch pore morphology

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 179, Issue 1, 2001, Pages 55-62

  Apel, P Yu ^a   Blonskaya, I V ^a   Didyk, A Yu ^a   Dmitriev, S N ^a   Orelovitch, O L ^a   Root, D ^b   Samoilova, L I ^a   Vutsadakis, V A ^a  

^a JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^b Corning Incorporated 45 Nagog Park ^*  (United States)

Author keywords

Etching; Heavy particle tracks; Surfactants; Track etch membranes

Indexed keywords

ADSORPTION; ETCHING; MORPHOLOGY; POLYMERIC MEMBRANES; SURFACE ACTIVE AGENTS;

TRACK-ETCH PORE MORPHOLOGY;

HIGH ENERGY PHYSICS;

EID: 0035371494     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00691-1     Document Type: Article

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