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Volumn , Issue , 2007, Pages 1480-1483
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A vertical hall device in standard submicron CMOS technology
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRIC CURRENTS;
ELECTRIC FAULT LOCATION;
HALL EFFECT DEVICES;
NONMETALS;
SILICON;
STANDARDS;
TECHNOLOGY;
WELDS;
1 / F NOISE;
ACTIVE AREAS;
CMOS TECHNOLOGIES;
DEEP N-WELL;
FEM SIMULATIONS;
HALL DEVICES;
HIGH VOLTAGES;
LOW COSTS;
N-TYPE SILICON;
OFFSET REDUCTION;
ON-CHIP CIRCUITRY;
SHORT CIRCUIT;
STANDARD CMOS TECHNOLOGY;
SUB-MICRON CMOS TECHNOLOGY;
SENSORS;
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EID: 48349135382
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICSENS.2007.4388694 Document Type: Conference Paper |
Times cited : (8)
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References (6)
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