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Volumn , Issue , 2007, Pages 523-526
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Characterization of fabrication related gap-height variations in capacitive micromachined ultrasonic transducers
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Author keywords
Bottom electrode; CMUT; Doped polysilicon; Gap height; In cavity deposition; Sealing; Surface roughness
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTROACOUSTIC TRANSDUCERS;
FRICTION;
GALLIUM ALLOYS;
IMAGING TECHNIQUES;
NONMETALS;
OPTICAL DESIGN;
PHOTORESISTS;
POLYSILICON;
SILICON;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
SURFACE TOPOGRAPHY;
ULTRASONICS;
AFM MEASUREMENTS;
BOTTOM ELECTRODE;
BOTTOM ELECTRODES;
BULK SILICON;
CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCERS;
CMUT;
COLLAPSE VOLTAGE;
DOPED POLYSILICON;
FABRICATION PROCESSES;
GAP-HEIGHT;
IN-CAVITY DEPOSITION;
OPERATION POINTS;
POLY SILICON FILMS;
POLYSILICON LAYERS;
PULL-IN;
RELEASE PROCESS;
SEALING;
ULTRASONIC TRANSDUCERS;
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EID: 48149096016
PISSN: 10510117
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ULTSYM.2007.138 Document Type: Conference Paper |
Times cited : (15)
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References (4)
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