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Journal of Applied Physics

Volumn 104, Issue 1, 2008, Pages

Growth atmosphere dependence of transport properties of NiO epitaxial thin films

(5) Oka, Keisuke a Yanagida, Takeshi a Nagashima, Kazuki a Tanaka, Hidekazu a Kawai, Tomoji a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DATA STORAGE EQUIPMENT; EPITAXIAL FILMS; EPITAXIAL GROWTH; GRAIN BOUNDARIES; HEAT CONDUCTION; MECHANISMS; NICKEL; SOLIDS; SWITCHING SYSTEMS; THICK FILMS; THIN FILMS; TRANSPORT PROPERTIES;

AMERICAN INSTITUTE OF PHYSICS (AIP); BAND EDGES; CONDUCTION MECHANISMS; EPITAXIAL THIN FILMS; EPITAXIALLY GROWN; FILM CRYSTALLINITY; GROWTH ATMOSPHERE; LOW TEMPERATURE GROWN (LTG); MICROSTRUCTURAL ANALYSIS; NIO FILMS; NIO THIN FILMS; NON-VOLATILE; P -TYPE CONDUCTION; RESISTIVE SWITCHING; RESISTIVE SWITCHING MEMORY; SECOND PHASES;

MOLECULAR BEAM EPITAXY;

EID: 47749115347 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2952012 Document Type: Article

Times cited : (26)

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