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Volumn 378, Issue 1, 2008, Pages 9-16

Pitting corrosion in CVD SiC at 300 °C in deoxygenated high-purity water

(6) Henager Jr , Charles H a Schemer Kohrn, Alan L a Pitman, Stan G a Senor, David J a Geelhood, Kenneth J a Painter, Chad L a

a PACIFIC NORTHWEST NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMISTRY; CORROSION; PITTING; PRESSURE; SILICA; SILICATE MINERALS; SILICON CARBIDE; SILICON COMPOUNDS; STANDARDS; WATER VAPOR;

(1 1 0) SURFACE; (I ,J) CONDITIONS; CHEMICAL VAPORS; CVD SIC; ELEVATED TEMPERATURES; ELSEVIER (CO); GENERAL CORROSION; HIGH PRESSURE (HP); HIGH-PURITY; MODERATE TEMPERATURES; NUCLEAR APPLICATIONS; OPERATING CONDITIONS; PITTING CORROSION (C); PRESSURIZED WATER; WATER CHEMISTRY; WATER REACTORS;

WATER ANALYSIS;

EID: 47549092734 PISSN: 00223115 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnucmat.2008.03.025 Document Type: Article

Times cited : (45)

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