Gas adsorption and capillary condensation in nanoporous alumina films

Nanotechnology

Volumn 19, Issue 31, 2008, Pages

  Casanova, Fèlix ^a   Chiang, Casey E ^a   Li, Chang Peng ^a,b   Roshchin, Igor V ^a,c   Ruminski, Anne M ^a   Sailor, Michael J ^a   Schuller, Ivan K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALUMINA; CONDENSATION; GAS ADSORPTION; HYSTERESIS; LIQUIDS; MOLECULAR BEAM EPITAXY; NANOPORES; NANOSTRUCTURED MATERIALS; ORE TREATMENT; PORE SIZE; SEMICONDUCTING CADMIUM TELLURIDE; SENSORS; TOLUENE; VAN DER WAALS FORCES; VAPORS; WETTING;

ADSORBED FILMS; CAPILLARY CONDENSATION (CC); CAPILLARY EVAPORATION; COMPLETE WETTING; CYLINDRICAL PORES; GAS SENSORS; GEOMETRIC PARAMETERS; HYSTERETIC BEHAVIOR; ISOPROPANOL (IPA); KELVIN EQUATION (KE); LIQUID-VAPOR (LV) EQUILIBRIA; NANOPOROUS ALUMINA FILMS; OPTICAL INTERFEROMETRY; OPTICAL RESPONSES; ORGANIC VAPORS; PORE-SIZE DISTRIBUTION (PSD); REPRODUCIBILITY; STRUCTURAL MEASUREMENTS; SURFA CE WETTING; VAN DER WAALS;

OPTICAL FILMS;

ALUMINUM HYDROXIDE; NANOFILM;

ADSORPTION; ARTICLE; BIOSENSOR; CAPILLARY; GAS; HYSTERESIS; INTERFEROMETRY; ISOTHERM; NANOFABRICATION; NANOPORE; POLYMERIZATION; PRIORITY JOURNAL; VAPORIZATION;

EID: 47249094431     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/31/315709     Document Type: Article

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