Controllable synthesis, characterization and microwave absorption properties of magnetic Ni1-xCoxP alloy nanoparticles attached on carbon nanotubes

Journal of Physics D: Applied Physics

Volumn 41, Issue 12, 2008, Pages

  Li, Yongjie ^a   Zhu, Cunzhen ^a   Wang, Chunming ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; NICKEL ALLOYS;

CONTROLLABLE SYNTHESIS; MAGNETIC (CE); MICROWAVE ABSORPTION PROPERTIES;

NICKEL;

EID: 47249083347     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/12/125303     Document Type: Article

References (48)

1. Lim K M, Kim M C, Lee K A and Park C G 2003 IEEE Trans. Magn. 39 1836
2. Sugimoto S et al 1998 Mater. Trans. 39 1080
3. Yusoff A N, Abdullah M H, Ahmad S H, Jusoh S F, Mansor A A and Hamid S A A 2002 J. Appl. Phys. 92 876
4. Yusoff A N and Abdullah M H 2004 J. Magn. Magn. Mater. 269 271
5. Porcelli M, Cacciapuoti G, Fusco S, Massa R, d'Ambrosio G, Bertoldo C, De Rosa M and Zappia V 1997 FEBS Lett. 402 102
6. Jauchem J R, Ryan K L and Frei M R 2000 Bioelectromagnetics 21 159
7. Lai H and Singh N P 1997 Bioelectromagnetics 18 446
8. Veyret B, Bouthet C, Deschaux P, de Seze R, Geffard M, Joussot-Dubien J, le Diraison M, Moreau J M and Caristan A 1991 Bioelectromagnetics 12 47
9. Ritcher E, Berman T, Ben-Michael E, Laster R and Westin J B 2000 Int. J. Occup. Environ. Health 6 187
10. Meshram M R, Agrawal N K, Sinha B and Misra P S 2004 J. Magn. Magn. Mater. 271 207
11. Shen G, Xu Z and Li Y 2006 J. Magn. Magn. Mater. 301 325
12. Liu J R, Itoh M and Machida K 2003 Appl. Phys. Lett. 83 4017
13. Miura K, Masuda M, Itoh M, Horiikawa T and Machida K 2006 J. Alloys Compounds 408-412 1391
14. Zhang B, Lu G, Feng Y, Xiong J and Lu H 2006 J. Magn. Magn. Mater. 299 205
15. Fan Z J, Luo G H, Zhang Z F, Zhou L and Wei F 2006 Mater. Sci. Eng. B-Solid State Mater. Adv. Technol. 132 85
16. Ch. Che R, Peng L M, Duan X F, Chen Q and Liang X L 2004 Adv. Mater. 16 401
17. Robert F 1998 Science 281 940
18. Dai H J, Wong E W and Lieber C M 1996 Science 272 523
19. Coq B, Planeix J M and Brotons V 1998 Appl. Catal. A-Gen. 173 175
20. Liu Z J, Xu Z D, Yuan Z Y, Lu D Y, Chen W X and Zhou W Z 2001 Catal. Lett. 72 203
21. Steigerwalt E S, Deluga G A and Lukehart C M 2002 J. Phys. Chem. B 106 760
22. Che G, Lakshmi B B, Martin C R and Fisher E R 1999 Langmuir 15 750
23. Liu Z J, Xu Z D, Yuan Z Y, Chen W X, Zhou W Z and Peng L M 2003 Mater. Lett. 57 1339
24. Xu Q, Zhang L and Zhu J 2003 J. Phys. Chem. B 107 8294
25. Ang L M, Andy Hor T S, Xu G Q, Tung C H, Zhao S P and Wang J L S 2000 Carbon 38 363
26. Wu H Q, Cao Y J, Yuan P S, Xu H Y and Wei X W 2005 Chem. Phys. Lett. 406 148
27. Wu H Q, Yuan P S, Xu H Y, Xu D M, Geng B Y and Wei X W 2006 J. Mater. Sci. 41 6889
28. Kong J, Chapline M G and Dai H 2001 Adv. Mater. 13 1384
29. Xue B, Chen P, Hong Q, Liu J and Tan K L 2001 J. Mater. Chem. 11 2378
30. Ye X R, Lin Y H and Wai C M 2003 Chem. Commun. 5 642
31. Satishkumar B C, Vogl E M, Govindaraj A and Rao C N R 1996 J. Phys. D: Appl. Phys. 29 3173
32. Huang Y, Shi K, Liao Z J, Wang Y L, Wang L and Zhu F 2007 Mater. Lett. 61 1742
33. Wu H Q, Shao M W, Gu J S and Wei X W 2004 Mater. Lett. 58 2166
34. Chien C C and Jeng K T 2006 Mater. Chem. Phys. 99 80
35. Caturla F, Molina F, Moline-Sabio M and Rodriguez-Reinoso F 1995 J. Electrochem. Soc. 142 4084
36. Fenineche N E, Hamzaoui R and El Kedim O 2003 Mater. Lett. 57 4165
37. Glenn O M and Juan B H 1990 Electroless Plating: Fundamentals, Applications (Orlando, FL: American Electroplaters and Surface Finishers Society)
38. Chiang H H and Shen W 2001 The Fundamentals and Practice of Electroless Plating (Beijing: National Defense Industry Publisher)
39. Rivero G, Multigner M, Garcia J M, Crespo P and Hernando A 1998 J. Magn. Magn. Mater. 177-181 119
40. Matsubara H and Yamada A 1994 J. Electrochem. Soc. 141 2386
41. Wu M Z, He H H, Zhao Z S and Yao X 2000 J. Phys. D: Appl. Phys. 33 2927
42. Wu M Z, He H H, Zhao Z S and Yao X 2000 J. Phys. D: Appl. Phys. 33 2398
43. Chen P, Wu R X, Zhao T E, Yang F and Xiao J Q 2005 J. Phys. D: Appl. Phys. 38 2302
44. Verma A, Saxena A K and Dube D C 2003 J. Magn. Magn. Mater. 263 228
45. Matsumoto M and Miyata Y 1997 IEEE Trans. Magn. 33 4459
46. Wu M Z, Yao X, Zhai J W and Zhang L Y 2001 Meas. Sci. Technol. 12 1932
47. Kim S S, Yoon Y C and Kim K H 2003 J. Electroceram. 10 95
48. Kim S S, Jo S B, Gueon K I, Choi K K, Kim J M and Churn K S 1991 IEEE Trans. Magn. 27 5462