Three-dimensional SU-8 sub-micrometer structuring by electron beam lithography

Microelectronic Engineering

Volumn 85, Issue 7, 2008, Pages 1639-1641

  Koller, Daniel M ^a   Hohenau, Andreas ^a   Ditlbacher, Harald ^a   Galler, Nicole ^a   Baudrion, Anne Laure ^a   Reil, Frank ^a   Schausberger, Stefan ^a   Aussenegg, Franz R ^a   Leitner, Alfred ^a   Krenn, Joachim R ^a  

^a UNIVERSITY OF GRAZ   (Austria)

Author keywords

3D mask fabrication; Electron beam lithography; Microfluidic channel; SU 8

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; EVAPORATION; MICROFLUIDICS; PLASTICS CASTING; THIN FILMS;

MICROFLUIDIC CHANNELS; SU-8; THREE DIMENSIONAL MASK FABRICATION;

PHOTORESISTS;

EID: 46549087995     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.03.019     Document Type: Article

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