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Volumn 26, Issue 4, 2008, Pages 1030-1036
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A model for calculating resputter rates in codeposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ARBITRARY NUMBERS;
CO-DEPOSITION;
CODEPOSITED;
COMBINATORIAL RESEARCH;
DC-MAGNETRON SPUTTERING;
DEPOSITION PROFILES;
ELEMENTAL COMPOSITIONS;
FILM COMPOSITIONS;
GAS ATOMS;
HIGH-THROUGHPUT (HT);
IN COMPOSITION;
INDIVIDUAL (PSS 544-7);
PARAMETRIZATIONS;
POW ERFUL TOOL;
RE-SPUTTERING;
ATOMIC PHYSICS;
ATOMS;
CHEMICAL ANALYSIS;
LEAD;
LIQUID PHASE EPITAXY;
MAGNETRON SPUTTERING;
MOLECULAR BEAM EPITAXY;
PLATINUM;
SPUTTER DEPOSITION;
STANDARDS;
STRUCTURE (COMPOSITION);
THICK FILMS;
VAPOR DEPOSITION;
FILM GROWTH;
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EID: 46449105107
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2885213 Document Type: Article |
Times cited : (6)
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References (12)
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