Fe catalytic growth, microstructure, and low-threshold field emission properties of open ended tubular graphite cones

Journal of Applied Physics

Volumn 103, Issue 12, 2008, Pages

  Shang, N G ^a   Papakonstantinou, P ^a   McLaughlin, J ^a   Chen, W C ^b   Chen, L C ^b   Chu, M ^c   Stamboulis, A ^c  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARCHITECTURAL ACOUSTICS; CARBON; CARBON NANOTUBES; CATALYSIS; CLARIFICATION; DIAMOND FILMS; ECOLOGY; ELECTRON MICROSCOPY; EMISSION SPECTROSCOPY; EPITAXIAL GROWTH; FIELD EMISSION; GRAPHITE; IRON; LITHOGRAPHY; METALLIZING; METALS; MICROWAVES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING; TRANSMISSION ELECTRON MICROSCOPY;

AMERICAN INSTITUTE OF PHYSICS (AIP); AS-GROWN; AVERAGE GROWTH RATE; BASE-GROWTH MECHANISM; CATALYTIC GROWTH; CONFOCAL MICRO-RAMAN; CROSS-SECTIONAL SCANNING ELECTRON MICROSCOPY (XSEM); EMISSION PERFORMANCE; FE CATALYSTS; INDIVIDUAL (PSS 544-7); INTEGRATED INTENSITIES; LARGE AREAS; LOW THRESHOLD FIELD EMISSION; MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (MP CVD); NANO TUBE; ORDER-OF MAGNITUDES; SI(0 0 1) SURFACE; SI(2 1 1) SUBSTRATES; SITE SELECTIVE; STABLE EMISSIONS; TUBULAR GRAPHITE CONES (TGC); TURN-ON FIELD; UNIFORMLY DISTRIBUTED;

VAPOR DEPOSITION;

EID: 46449097744     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2943265     Document Type: Article

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