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Volumn 384, Issue 1-2, 2004, Pages 275-283

Erratum: "A study of nanoscratch experiments of the silicon and borosilicate in air" (Materials Science and Enginering A (2004) vol. 384 (1-2) (275-283) 10.1016/j.msea.2004.06.044);A study of nanoscratch experiments of the silicon and borosilicate in air

Author keywords

Borosilicate; Mechanochemical reaction; Nano scratch; Silicon

Indexed keywords

CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; DEFORMATION; DIAMONDS; ELASTIC MODULI; ELASTOPLASTICITY; FINITE ELEMENT METHOD; FRICTION; SILICON COMPOUNDS; STRENGTH OF MATERIALS; SURFACE TREATMENT;

EID: 4644356492     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2004.10.021     Document Type: Erratum
Times cited : (46)

References (23)
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    • K. Ashida, L. Chen, N. Morita, New maskless micro-fabrication technique of single-crystal silicon using the combination of nanometer-scale machining and wet etching, in: Proceedings of Second Euspen International Conference, 2001. Turin, Italy, May: 78 (European Society for Precision Engineering and Nanotechnology, www.euspen.org/)
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    • Study on nano-machining process using mechanism of a friction force microscope
    • Tokyo, Japan: The Japan Society of Mechanical Engineers
    • K. Ashida N. Morita Y. Shosida Study on nano-machining process using mechanism of a friction force microscope. JSME International Journal Series C 2001 The Japan Society of Mechanical Engineers Tokyo, Japan
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    • Ashida, K.1    Morita, N.2    Shosida, Y.3
  • 14
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    • Microwear process
    • Proceedings of the International Conference in Tribology, Yokohama Tokyo, Japan: JAST Press
    • Y. Ando R. Kaneko Microwear process, in: Proceedings of the International Conference in Tribology, Yokohama 1995 JAST Press Tokyo, Japan
    • (1995)
    • Ando, Y.1    Kaneko, R.2
  • 20
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    • Ductile-regime turning mechanism of single-crystal silicon
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    • J. Yan K. Syoji H. Suzuki T. Kuriyagawa Ductile-regime turning mechanism of single-crystal silicon 1998 Japan Society for Precision Engineering Tokyo, Japan
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    • Yan, J.1    Syoji, K.2    Suzuki, H.3    Kuriyagawa, T.4
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    • Microprotuberance processing of silicon by diamond tip scanning
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    • S. Miyake J. Kim Microprotuberance processing of silicon by diamond tip scanning 1999 Japan Society for Precision Engineering Tokyo, Japan
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    • Miyake, S.1    Kim, J.2
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    • Microindentation tests of single crystal silicon - Microindentation behavior and measurement of ductile to brittle transition
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    • S. Koshimizu J. Otsuka Microindentation tests of single crystal silicon - microindentation behavior and measurement of ductile to brittle transition 1998 Japan Society for precision Engineering Tokyo, Japan
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    • Koshimizu, S.1    Otsuka, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.