Structure and magnetic properties of iron nitride films prepared by reactive dc magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 7 A, 2004, Pages 4166-4170

  Naganuma, Hiroshi ^a   Nakatani, Ryoichi ^a   Endo, Yasushi ^a   Kawamura, Yoshio ^a   Yamamoto, Masahiko ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Fe2.2N; Fe2N; Amorphous; Coercivity; Grain size; Iron nitride film; Nanocrystalline; Saturation magnetization

Indexed keywords

AMORPHOUS MATERIALS; ARGON; COERCIVE FORCE; FLOW OF FLUIDS; GRAIN SIZE AND SHAPE; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITROGEN; PHASE COMPOSITION; STRUCTURAL ANALYSIS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS FLOW RATES; IRON NITRIDE FILMS; PHASE CHANGES; SELECTED AREA DIFFRACTION PATTERNS;

IRON COMPOUNDS;

EID: 4644310571     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.4166     Document Type: Article

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