Effect of substrate on the characteristics of manganese(IV) oxide thin films prepared by atomic layer deposition

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 65-74

  Nilsen, O ^a   Foss, S ^a   Fjellvag H ^a   Kjekshus, A ^a  

^a UNIVERSITY OF OSLO   (Norway)

Author keywords

Atomic layer deposition (ALD); Effect of substrate; Manganese(IV) oxide (MnO2)

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRODEPOSITION; MANGANESE COMPOUNDS; MOLECULAR BEAM EPITAXY; OXIDATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ANODIC OXIDATIONS; ATOMIC LAYER DEPOSITION (ALD); CHEMICAL PROPERTIES; SURFACE STRUCTURES;

THIN FILMS;

EID: 4644252359     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.055     Document Type: Article

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