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Volumn 491, Issue 1-2, 2008, Pages 461-469
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Reactive wetting and spreading of Al-Si-Mg alloys on Si3N4/Si substrates
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Author keywords
Al Si Mg alloys; Contact angle; Reactive wetting; Si3N4 Si substrates; Surface tension
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Indexed keywords
ALUMINUM ALLOYS;
ARGON;
CHEMICAL BONDS;
MAGNESIA;
MAGNESIUM ALLOYS;
NITROGEN;
NITROGEN COMPOUNDS;
PHASE INTERFACES;
SILICON ALLOYS;
SURFACE REACTIONS;
SURFACE TENSION;
WETTING;
CHEMICAL INTERACTIONS;
DROPLET SURFACES;
OPTIMIZED CONDITIONS;
PROCESSING PARAMETERS;
REACTIVE WETTING;
SESSILE DROP TECHNIQUES;
SI SUBSTRATES;
SI3N4/SI SUBSTRATE;
WETTING AND SPREADING;
WETTING BEHAVIOR;
CONTACT ANGLE;
ALLOY;
ALUMINUM;
ARGON;
CHEMICAL REACTIONS;
CONTACT ANGLE;
DROPS;
IMPURITIES;
MAGNESIUM;
NITROGEN;
PRINTING PLATES;
SILICON;
SUBSTRATES;
SURFACE TENSION;
TERNARY SYSTEMS;
WETTING;
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EID: 46249116733
PISSN: 09215093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.msea.2008.02.025 Document Type: Article |
Times cited : (17)
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References (32)
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