Effect of rapid thermal annealing on thermoelectric thin films prepared by sputtering

International Conference on Thermoelectrics, ICT, Proceedings

Volumn , Issue , 2006, Pages 455-458

  Kim, Dong Ho ^a   Lee, Gun Hwan ^a   Choi, Heon Oh ^a   Kim, Ook Joong ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BISMUTH PLATING; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SILICON COMPOUNDS; THERMOELECTRICITY; THICK FILMS;

BI SB TE; INTERNATIONAL CONFERENCES;

FILM PREPARATION;

EID: 46149120834     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICT.2006.331313     Document Type: Conference Paper

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