The fabrication of nano structures on wafer surface by using nano Island lithography

Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS

Volumn , Issue , 2006, Pages 882-885

  Yi, Futing ^a,b   Zhang, Jufang ^a   Luo, Liang ^a  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

^b Institute of High Energy Physics

Author keywords

MEMS; Nano island lithography; Nano structures; NEMS

Indexed keywords

BOTTOM-UP; CESIUM CHLORIDE; FABRICATION TECHNOLOGIES (CO); HIERARCHICAL STRUCTURING; HYBRID METHODS; IMPERIAL COLLEGE; INTERNATIONAL CONFERENCES; MATERIAL SURFACES; MOLECULAR SYSTEMS; NANO SCALING; NANO SIZES; NANO STRUCTURING; NOVEL METHODS; ON-WAFER; PROCESSING TECHNOLOGIES; SUPER HYDROPHOBIC SURFACES; THREE DIMENSIONAL (3 D) IMAGING; TOP-DOWN; UV LITHOGRAPHY;

ALKALI METALS; CESIUM; CESIUM ALLOYS; FABRICATION; FILM GROWTH; GROWTH KINETICS; HYDROPHOBICITY; IMAGING SYSTEMS; LITHOGRAPHY; MOLECULES; NANOSTRUCTURES; NEMS; OPTICAL DESIGN; SURFACE CHEMISTRY; SURFACES; TECHNOLOGY; THICK FILMS; THREE DIMENSIONAL; VAPOR DEPOSITION; WATER VAPOR;

LANDFORMS;

EID: 46149112368     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2006.334557     Document Type: Conference Paper

References (6)

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3. Lin Feng, Shuhong Li, Yingshun Li, Huangjun Li, etal., Super-hydrophobic surfaces: from natural to artificial, Adv. Mater. 24(2002), pp. 1857-1860.
4. Yi Futing, Miao Peng, Peng Liangqiang, et al. A new method for fabrication of SU8 structures with a high aspect ratio using a mask-back exposure technique. Chinese journal of semiconductors. Jan. 2004(26-29).
5. Mino Green, Futing Yi, Light transmission through perforated metal thin film made by island lithography. Thin Solid Films 467 (2004) 308-312
6. Shin Tsuchiya, Mino Green, and R. R. A. Syms, Structural fabrication using cesium chloride island arrays as a resist in fluorocarbon reactive ion etching plasma, Electrochemical and Solid-State Letters, 3(1)44-46 (2000).