A micromachined optical double well for thermo-optic switching via resonant tunneling effect

Applied Physics Letters

Volumn 92, Issue 25, 2008, Pages

  Zhu, W M ^a   Zhang, X M ^b   Liu, A Q ^a   Cai, H ^a   Jonathan, T ^a   Bourouina, T ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF MARYLAND   (United States)

^c Ecole Superieure d'Ingenieurs en   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRACK PROPAGATION; LIGHT REFRACTION; NONMETALS; OPTICAL DESIGN; OPTICAL DEVICES; OPTICAL PROPERTIES; REFRACTIVE INDEX; REFRACTOMETERS; SILICON; SILICON WAFERS; SPEED; SWITCHING FUNCTIONS;

AIR GAPS; DEEP ETCHING; DOUBLE WELLS; EXTINCTION RATIO; FAST-SWITCHING SPEED; HIGH-LOW; LOW REFRACTIVE INDEX; LOW-POWER CONSUMPTION; MICROMACHINED; MICROMACHINED SILICON; MICROMACHINED SWITCHES; OPTIC SWITCHING; OPTICAL-; PHYSICAL PRINCIPLES; STRUCTURE FEATURES; SWITCHING SPEEDS; TUNNELING EFFECTS; WELL STRUCTURE;

SWITCHING;

EID: 46049113081     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2951621     Document Type: Article

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