Optimization of sub-melt laser anneal: Performance and reliability

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2006, Pages

  Severi, S ^a,b   Augendre, E ^a   Thirupapuliyur, S ^d   Ahmed, K ^d   Felch, S ^d   Parihar, V ^d   Nouri, F ^d   Hoffman, T ^a   Noda, T ^c   O'Sullivan, B ^a   Ramos, J ^a   Andrés, E San ^e   Pantisano, L ^a   De Keersgieter, A ^a   Schreutelkamp, R ^d   Jennings, D ^d   Mahapatra, S ^f   Moroz, V ^g   De Meyer, K ^a,b   Absil, P ^a   Jurczak, M ^a   Biesemans, S ^a   more..

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c PANASONIC CORPORATION   (Japan)

^d APPLIED MATERIALS INC   (United States)

^e UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^f INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^g SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ANNEALING; SION DIELECTRIC; THERMO-MECHANICAL STRESS; TRANSISTOR PERFORMANCE;

ELECTRON DEVICES; LASERS; STRESSES;

MOSFET DEVICES;

EID: 46049083057     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2006.346917     Document Type: Conference Paper

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