Analysis of near- and far-field intensities in ZnO based heterostructure waveguides

Journal of Modern Optics

Volumn 55, Issue 9, 2008, Pages 1427-1439

  Bhole, M P ^a   Samuel, E P ^a   Patil, D S ^a  

^a NORTH MAHARASHTRA UNIVERSITY   (India)

Author keywords

Heterostructure waveguides; Near and far field intensities; ZnO

Indexed keywords

ALUMINUM; ESTIMATION; FULL WIDTH AT HALF MAXIMUM; MAGNESIUM PRINTING PLATES; ZINC OXIDE;

ACTIVE LAYER THICKNESS; CONFINEMENT FACTOR; DOUBLE HETEROSTRUCTURE (DHS); FAR FIELD INTENSITY DISTRIBUTION (FFID); FAR FIELDS; FAR-FIELD INTENSITY; FULL WIDTH AT HALF-MAXIMUM (FWHM); HETERO STRUCTURES; HETEROSTRUCTURE WAVEGUIDES; JUNCTION PLANE; MOLE FRACTIONS; NEAR FIELDS;

HETEROJUNCTIONS;

ALUMINUM; ESTIMATION; MAGNESIUM; PLATES; PRINTING; ZINC OXIDE;

EID: 45849111849     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340701678894     Document Type: Article

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