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Volumn 6, Issue 3, 2007, Pages 153-166

Polysilicon interface engineering for improved PIP capacitors

Author keywords

[No Author keywords available]

Indexed keywords

INSULATING MATERIALS; LOW-K DIELECTRIC; NITRIDES; PLASTIC FILMS; SILICA; SILICON NITRIDE;

EID: 45849106155     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2728795     Document Type: Conference Paper
Times cited : (1)

References (8)
  • 1
    • 45849138729 scopus 로고    scopus 로고
    • American Society for Testing and Materials
    • J.S. Suehle, American Society for Testing and Materials (2000).
    • (2000)
    • Suehle, J.S.1
  • 2
    • 45849150233 scopus 로고    scopus 로고
    • ECS Transactions: Physics and Chemistry of SiO2 and the Si-SiO2
    • J.J. Naughton and J.M. Towner, ECS Transactions: Physics and Chemistry of SiO2 and the Si-SiO2 Interface 5, 243 (2005).
    • (2005) Interface , vol.5 , pp. 243
    • Naughton, J.J.1    Towner, J.M.2
  • 4
    • 45849138029 scopus 로고    scopus 로고
    • G. Fuse, S. Shibata and Y. Kato, Trans. Ion Implantation Technology, 642 (1996).
    • G. Fuse, S. Shibata and Y. Kato, Trans. Ion Implantation Technology, 642 (1996).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.