Area selective atomic layer deposition of titanium dioxide

ECS Transactions

Volumn 3, Issue 15, 2006, Pages 233-241

  Sinha, A ^a   Henderson, C L ^a   Hess, D W ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CHLORINE COMPOUNDS; OXIDE MINERALS; OXYGEN; POLYMER FILMS; SEMICONDUCTING FILMS;

CHEMICALLY AMPLIFIED; INTRINSIC REACTIVITY; OXYGEN PLASMA ETCHING; PATTERN TRANSFERS; PATTERNED GROWTH; PHOTO-DEFINABLE; TITANIUM DIOXIDES (TIO2); TOP SURFACE IMAGING;

TITANIUM DIOXIDE;

EID: 45749143585     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2721492     Document Type: Conference Paper

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