Hydrogen isotope sputtering of graphite by molecular dynamics simulation

Thin Solid Films

Volumn 516, Issue 19, 2008, Pages 6553-6559

  Ito, Atsushi ^a   Nakamura, Hiroaki ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

Carbon; Chemisorption; Computer simulation; Deuterium; Graphite; Hydrogen; Plasma processing and deposition; Sputtering

Indexed keywords

ATOMIC PHYSICS; ATOMS; CARBON; CHEMICAL BONDS; DEUTERIUM; DISTRIBUTION FUNCTIONS; EROSION; GRAPHITE; HYDROGEN; ISOTOPES; MECHANICS; MOLECULAR DYNAMICS; MOLECULAR MECHANICS; MOLECULES; NANOFLUIDICS; NONMETALS; QUANTUM CHEMISTRY; REACTIVE SPUTTERING; SEMICONDUCTOR MATERIALS; SOIL MECHANICS; SPUTTER DEPOSITION; SURFACE POTENTIAL; SURFACE PROPERTIES; SURFACES; TRITIUM;

(1 1 0) SURFACE; DECAY TIME CONSTANTS; ELSEVIER (CO); EROSION YIELDS; GRAPHENE LAYERS; GRAPHITE SURFACES; HYDROGEN ATOMS; HYDROGEN ISOTOPES; INCIDENT ENERGIES; INCIDENT PARTICLES; MOLECULAR-DYNAMICS (MD) SIMULATIONS; POWER FUNCTIONS; RADIAL DISTRIBUTION FUNCTION (RDF); REACTIVE EMPIRICAL BOND ORDER (REBO) POTENTIAL; STEADY STATES; TRITIUM ATOMS;

DYNAMICS;

EID: 45549109988     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.091     Document Type: Article

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