Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Kumazaki, Takahito ^a   Suzuki, Toru ^a   Tanaka, Satoshi ^a   Nohdomi, Ryoichi ^a   Yoshino, Masaya ^a   Matsumoto, Shinichi ^a   Kawasuji, Yasufumi ^a   Umeda, Hiroshi ^a   Nagano, Hitoshi ^a   Kakizaki, Kouji ^a   Nakarai, Hiroaki ^a   Matsunaga, Takashi ^a   Fujimoto, Junichi ^a   Mizoguchi, Hakaru ^a  

^a GIGAPHOTON INC   (Japan)

Author keywords

193nm; 45nm node; ArF; Excimer laser; High power; Immersion; Injection lock; Spectrum bandwidth

Indexed keywords

ARGON; COMPUTER NETWORKS; FARM BUILDINGS; INERT GASES; LASER BEAMS; LASERS; LIGHT SOURCES; LIGHTING; LITHOGRAPHY; MACHINE TOOLS; MULTITASKING; PRODUCTION ENGINEERING; PULSED LASER DEPOSITION;

45NM NODE; ARF IMMERSION LITHOGRAPHY; ARF LASERS; ARGON FLUORIDE; BANDWIDTH CONTROL; HIGH POWERS; IMMERSION LITHOGRAPHY (IML); LASER LIGHT; LASER PERFORMANCES; LINE NARROWING; MASS PRODUCTION; OPTICAL MICRO LITHOGRAPHY;

LIGHT;

EID: 45449089278     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.778149     Document Type: Conference Paper

References (10)

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