The formation of ordered nanoholes in binary, chemically similar, symmetric diblock copolymer blend films

Macromolecular Rapid Communications

Volumn 25, Issue 12, 2004, Pages 1181-1185

  Xuan, Yu ^a   Peng, Juan ^a   Wang, Hanfu ^a   Li, Binyao ^a   Han, Yanchun ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

Blends; Block copolymers; Films; Phase separation; Self assembly

Indexed keywords

MOLECULAR WEIGHT; SILICON; SUBSTRATES; THIN FILMS;

DIBLOCK COPOLYMER BLENDS; SILICON STRUCTURES;

BLOCK COPOLYMERS;

COPOLYMER; METHACRYLIC ACID DERIVATIVE; SILICON;

ABSORPTION; ARTICLE; CHEMICAL STRUCTURE; MOLECULAR WEIGHT;

EID: 4544339893     PISSN: 10221336     EISSN: None     Source Type: Journal    
DOI: 10.1002/marc.200400060     Document Type: Article

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