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Volumn 225, Issue 4, 2004, Pages 503-508

Depth profiles of MeV heavy ions implanted into Si and lithium triborate

Author keywords

Depth profile; Lithium triborate; MeV ion implantation; Secondary ion mass spectrometry; Silicon

Indexed keywords

COPPER; HEAVY IONS; ION IMPLANTATION; NICKEL; NUCLEAR INSTRUMENTATION; SECONDARY ION MASS SPECTROMETRY; SILICON;

EID: 4544313512     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(04)00812-2     Document Type: Article
Times cited : (3)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.