Stabilising electrode|redox liquid|aqueous solution system with hydrophobic silicate film

Electrochemistry Communications

Volumn 6, Issue 5, 2004, Pages 475-479

  Niedziolka, Joanna ^a   Opallo, Marcin ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Cyclic voltammetry; Gold electrode; Redox liquid; Sol gel; Thin film

Indexed keywords

CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; GOLD; HYDROPHOBICITY; REDOX REACTIONS; SILANES; SOLUTIONS;

GOLD ELECTRODES; HYDROPHOBIC SILICATE FILMS; VOLTAMMETRIC RESPONSE;

ELECTROCHEMICAL ELECTRODES;

3 MERCAPTOPROPYLTRIMETHOXYSILANE; FERROCENE DERIVATIVE; GOLD; METHYLTRIMETHOXYSILANE; SILANE DERIVATIVE; SILICATE; TERT BUTYLFERROCENE; UNCLASSIFIED DRUG;

AQUEOUS SOLUTION; ARTICLE; CYCLIC POTENTIOMETRY; ELECTROCHEMISTRY; ELECTRODE; FILM; HYDROPHOBICITY; OXIDATION REDUCTION REACTION;

EID: 4544308313     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2004.03.008     Document Type: Article

References (30)

1. Marken F., Webster R.D., Bull S.D., Davies S.G. J. Electroanal. Chem. 437:1997;209.
2. Banks C.E., Davies T.J., Evans R.G., Hignett G., Wain A.J., Lawrence N.S., Wadhawan J.D., Marken F., Compton R.G. Phys. Chem. Chem. Phys. 5:2003;4053.
3. Marken F., Compton R.G., Goeting C.H., Foord J.S., Bull S.D., Davies S.G. Electroanalysis. 10:1998;821.
4. Marken F., Hayman C.M., Bulman Page P.C. Electroanalysis. 14:2002;172.
5. Wittstock G., Emons H., Heineman W.R. Electroanalysis. 8:1996;67.
6. Wadhawan J.D., Evans R.G., Compton R.G. J. Electroanal. Chem. 533:2002;71.
7. Schröder U., Wadhawan J.D., Evans R.G., Compton R.G., Wood B., Walton D.J., France R.R., Marken F., Bulman Page P.C., Hayman C.M. J. Phys. Chem. B. 106:2002;8697.
8. Wadhawan J.D., Wain A.J., Kirkham A.N., Walton D.J., Wood B., France R.R., Bull S.D., Compton R.G. J. Am. Chem. Soc. 125:2003;11418.
9. Hofmeister F. Arch. Exp. Pathol. Pharmakol. 24:1888;247.
10. Opallo M., Saczek-Maj M. Electrochem. Commun. 3:2001;306.
11. Opallo M., Saczek-Maj M. Chem. Commun. 2002;448.
12. Tsionsky M., Gun G., Glezer V., Lev O. Anal. Chem. 66:1994;1747.
13. G. Shul, M. Saczek-Maj, M. Opallo, Electroanalysis 16 (2004) (in press)
14. Dvorak O., De Armond M.K. J. Phys. Chem. 97:1993;2646.
15. Collinson M.M., Rausch C.G., Voigt A. Langmuir. 13:1997;7245.
16. Walcarius A. Chem. Mater. 13:2001;3351.
17. Shacham R., Avnir D., Mandler D. Adv. Mater. 11:1999;384.
18. Khoo S.B., Chen F. Anal. Chem. 74:2002;5734.
19. Wang J., Pamidi P.V.A., Zanette D.R. J. Am. Chem. Soc. 120:1998;5852.
20. Collinson M.M., Wang H., Makote R., Khramov A. J. Electroanal. Chem. 519:2002;65.
21. M. Opallo, M. Saczek-Maj, G. Shul, C.M. Hayman, P.C. Bulman Page, F. Marken, Electrochim. Acta (in press)
22. Dietz S., Bell W.L., Cook R.L. J. Organomet. Chem. 545-546:1997;67.
23. Ryabov A.D., Ryabova E.S., Reshetova M.D. J. Organomet. Chem. 637-639:2001;469.
24. Bharathi S., Lev O. Langmuir. 17:2001;1.
25. Pladziewicz J.R., Espenson J.H. J. Am. Chem. Soc. 95:1973;56.
26. Lovric M., Scholz F. J. Electroanal. Chem. 540:2003;89.
27. Raman N.K., Anderson M.T., Brinker C.J. J. Chem. Mater. 8:1996;1682.
28. Khramov A.N., Munos J., Collinson M.M. Langmuir. 17:2001;8112.
29. Walcarius A., Etienne M., Lebeau B. Chem. Mater. 15:2003;2161.
30. Yantasee W., Lin Y.H., Li X.H., Fryxell G.E., Zemanian T.S., Viswanathan V.V. Analyst. 128:2003;899.