Surface modification of Cl-adsorbed Si(1 1 1)-7 × 7 by the irradiation of infrared pulsed laser

Surface Science

Volumn 566-568, Issue 1-3 PART 2, 2004, Pages 1137-1142

  Kirimura, Tomoyuki ^a,b   Shirao, Tetsuro ^a,b   Shudo, Ken Ichi ^a,b   Tanaka, Yoshihito ^b   Ishikawa, Tetsuya ^b   Tanaka, Masatoshi ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b RIKEN   (Japan)

Author keywords

Chlorine; Photon stimulated desorption (PSD); Silicon

Indexed keywords

ADSORPTION; DESORPTION; IRRADIATION; LASER PULSES; LOW ENERGY ELECTRON DIFFRACTION; MASS SPECTROMETERS; SEMICONDUCTOR MATERIALS; SILICON; SURFACE TREATMENT; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRONIC EXCITATIONS; INFRARED (IR) PULSED LASER; PHOTON STIMULATED DESORPTION (PSD); TEMPERATURE PROGRAMMED DESORPTION (TDP);

CHLORINE;

EID: 4544307836     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.06.071     Document Type: Article

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