메뉴 건너뛰기




Volumn 4, Issue 5, 2004, Pages 584-588

Filter-protected photodiodes for high-throughput enzymatic analysis

Author keywords

CMOS; Nicotinamid adenine dinucleotid Reduced form (NADH) enzymatic analysis; Silicon thin film; UV filter

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; ENZYMES; PHOTODIODES; POLYSILICON; RECRYSTALLIZATION (METALLURGY); SCANNING ELECTRON MICROSCOPY; THROUGHPUT;

EID: 4544279385     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2004.833186     Document Type: Article
Times cited : (6)

References (15)
  • 1
    • 0035296987 scopus 로고    scopus 로고
    • Making chips
    • Mar.
    • S. K. Moore, "Making chips," IEEE Spectr., pp. 54-60, Mar. 2001.
    • (2001) IEEE Spectr. , pp. 54-60
    • Moore, S.K.1
  • 3
    • 1542502096 scopus 로고    scopus 로고
    • Electrochemical analysis in picoliter micrivials
    • R. A. Clark, P. B. Hietpas, and A. G. Ewing, "Electrochemical analysis in picoliter micrivials," Anal. Chem., vol. 69, pp. 256-263, 1997.
    • (1997) Anal. Chem. , vol.69 , pp. 256-263
    • Clark, R.A.1    Hietpas, P.B.2    Ewing, A.G.3
  • 6
    • 0004222320 scopus 로고    scopus 로고
    • Ph.D. dissertation, Delft University, Delft, The Netherlands
    • D. P. Poenar, "Thin film color sensors," Ph.D. dissertation, Delft University, Delft, The Netherlands, 1996.
    • (1996) Thin Film Color Sensors
    • Poenar, D.P.1
  • 7
    • 0009723969 scopus 로고    scopus 로고
    • Optical properties of thin-film silicon-compatible materials
    • July
    • D. P. Poenar and R. F. Wolffenbuttel, "Optical properties of thin-film silicon-compatible materials," Appl. Opt., vol. 36, no. 21, pp. 5122-5128, July 1997.
    • (1997) Appl. Opt. , vol.36 , Issue.21 , pp. 5122-5128
    • Poenar, D.P.1    Wolffenbuttel, R.F.2
  • 11
    • 0032072504 scopus 로고    scopus 로고
    • Smart optical sensor systems in CMOS for measuring light intensity and color
    • G. de Graaf and R. F. Wolffenbuttel, "Smart optical sensor systems in CMOS for measuring light intensity and color," Sens. Actuators A, vol. 67, pp. 115-119, 1998.
    • (1998) Sens. Actuators A , vol.67 , pp. 115-119
    • De Graaf, G.1    Wolffenbuttel, R.F.2
  • 12
    • 0022719826 scopus 로고
    • XeCl excimer laser annealing used in fabrication of poly-Si TFTs
    • T. Sameshima, S. Usui, and M. Sekiya, "XeCl excimer laser annealing used in fabrication of poly-Si TFTs," IEEE Electron Device Lett., vol. 7, p. 276, 1986.
    • (1986) IEEE Electron Device Lett. , vol.7 , pp. 276
    • Sameshima, T.1    Usui, S.2    Sekiya, M.3
  • 13
    • 36449004108 scopus 로고
    • Phase transformation mechanisms involved on excimer laser
    • J. S. Im, H. J. Kim, and M. O. Thompson, "Phase transformation mechanisms involved on excimer laser," Appl. Phys. Lett., vol. 63, p. 196, 1993.
    • (1993) Appl. Phys. Lett. , vol.63 , pp. 196
    • Im, J.S.1    Kim, H.J.2    Thompson, M.O.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.