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Volumn 36, Issue 21, 1997, Pages 5122-5128

Optical properties of thin-film silicon-compatible materials

Author keywords

Color sensor; Interference filter; Silicon compatible materials; Thin films

Indexed keywords


EID: 0009723969     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.005122     Document Type: Article
Times cited : (27)

References (22)
  • 2
    • 0025699053 scopus 로고
    • Optimizing the performance of spectrally selective photodiodes by simulated annealing techniques
    • A. S. Glass and R. Morf, “Optimizing the performance of spectrally selective photodiodes by simulated annealing techniques, ” Sens. Actuators A 21-23 564-569 (1990).
    • (1990) Sens. Actuators A , vol.21-23 , pp. 564-569
    • Glass, A.S.1    Morf, R.2
  • 3
    • 0025699025 scopus 로고
    • Photodiodes in polysilicon with an electrically-programmable UV response
    • R. F. Wolffenbuttel, “Photodiodes in polysilicon with an electrically-programmable UV response, ” Sens. Actuators A 21-23 559-563 (1990).
    • (1990) Sens. Actuators A , vol.21-23 , pp. 559-563
    • Wolffenbuttel, R.F.1
  • 6
    • 36149016256 scopus 로고
    • Optical constants of silicon in the region 1 to 10 eV
    • H. R. Philipp and E. A. Taft, “Optical constants of silicon in the region 1 to 10 eV, ” Phys. Rev. 120, 37-38 (1960).
    • (1960) Phys. Rev. , vol.120 , pp. 37-38
    • Philipp, H.R.1    Taft, E.A.2
  • 7
    • 36149008808 scopus 로고
    • Optical properties of semiconductors
    • H. R. Philipp and H. Ehrenreich, “Optical properties of semiconductors, ” Phys. Rev. 129, 1550-1560 (1963).
    • (1963) Phys. Rev. , vol.129 , pp. 1550-1560
    • Philipp, H.R.1    Ehrenreich, H.2
  • 8
    • 85010182319 scopus 로고
    • No. 4 of EMIS Datareviews Series INSPEC, Institution of Electrical Engineers, London
    • H. R. Philipp, Silicon-Oxides: Optical Functions, No. 4 of EMIS Datareviews Series INSPEC, Institution of Electrical Engineers, London, 1988, Chap. 28, pp. 1009-1028.
    • (1988) Silicon-Oxides: Optical Functions , vol.28 , pp. 1009-1028
    • Philipp, H.R.1
  • 12
    • 0005958173 scopus 로고
    • Structure analysis of silicon dioxide films formed by oxidation of silane
    • N. Nagasima, “Structure analysis of silicon dioxide films formed by oxidation of silane, ” J. Appl. Phys. 43, 3378-3385 (1972).
    • (1972) J. Appl. Phys. , vol.43 , pp. 3378-3385
    • Nagasima, N.1
  • 14
    • 4243198036 scopus 로고
    • Optimization of a low-stress silicon nitride process for surface micromachining applications
    • G. Blasquez, LAAS Press, Toulouse, France
    • P. J. French, R. F. Wolffenbuttel, R. Mallee, and P. M. Sarro, “Optimization of a low-stress silicon nitride process for surface micromachining applications, ” in Proceedings of the Eurosensors’94 Conference, G. Blasquez, ed. (LAAS Press, Toulouse, France, 1994), p. 205.
    • (1994) Proceedings of the Eurosensors’94 Conference , pp. 205
    • French, P.J.1    Wolffenbuttel, R.F.2    Mallee, R.3    Sarro, P.M.4
  • 15
    • 0020102122 scopus 로고
    • Silicon oxynitride: A material for GRIN optics
    • T. Baak, “Silicon oxynitride: a material for GRIN optics, ” Appl. Opt. 21, 1069-1072 (1982).
    • (1982) Appl. Opt. , vol.21 , pp. 1069-1072
    • Baak, T.1
  • 16
    • 0015435641 scopus 로고
    • Silicon oxynitride films on fused silica for optical waveguides
    • M. J. Rand and R. D. Stanley, “Silicon oxynitride films on fused silica for optical waveguides, ” Appl. Opt. 11, 2483-2488 (1972).
    • (1972) Appl. Opt. , vol.11 , pp. 2483-2488
    • Rand, M.J.1    Stanley, R.D.2
  • 17
    • 0021481095 scopus 로고
    • Low temperature plasma chemical vapor deposition of silicon oxynitride thin-film waveguides
    • D. K. W. Lam, “Low temperature plasma chemical vapor deposition of silicon oxynitride thin-film waveguides, ” Appl. Opt. 23, 2744-2746 (1984).
    • (1984) Appl. Opt. , vol.23 , pp. 2744-2746
    • Lam, D.K.W.1
  • 19
    • 0024030437 scopus 로고
    • High efficiency MIS/IL silicon solar cells with silicon oxynitride as ultra-thin tunneling film
    • X. Liu. L. Quanxi, and L. Enke, “High efficiency MIS/IL silicon solar cells with silicon oxynitride as ultra-thin tunneling film, ” Sol. Energy Mater. 17(4), 257-263 (1988).
    • (1988) Sol. Energy Mater. , vol.17 , Issue.4 , pp. 257-263
    • Quanxi, X.L.L.1    Enke, L.2
  • 20
    • 0021412109 scopus 로고
    • Reactively sputtered silicon oxynitride films for solar absorber antireflection coatings
    • A. D. Wilson, “Reactively sputtered silicon oxynitride films for solar absorber antireflection coatings, ” Sol. Energy Mater. 10, 9-24 (1984).
    • (1984) Sol. Energy Mater. , vol.10 , pp. 9-24
    • Wilson, A.D.1
  • 22
    • 0001323566 scopus 로고
    • Plasma-enhanced CVD: Oxides, nitrides, transition metals and transition metals silicides
    • D. W. Hess, “Plasma-enhanced CVD: oxides, nitrides, transition metals and transition metals silicides, ” J. Vac. Sci. Technol. A 2, 244-252 (1984).
    • (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 244-252
    • Hess, D.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.