E-beam inspection of dislocations: Product monitoring and process change validation

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2004, Pages 359-366

  Baltzinger, Jean Luc ^a   Desmercières, Stéphanie ^a   Lasserre, Sébastien ^a   Champonnois, Patrick ^a   Mercier, Michèle ^a  

^a Altis Semiconductor   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC POTENTIAL; EQUALIZERS; FEEDBACK; MATRIX ALGEBRA; OPTIMIZATION; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; STATIC RANDOM ACCESS STORAGE; TRANSMISSION ELECTRON MICROSCOPY;

BIT LINE (BL); E-BEAM INSPECTION; PRODUCT MONITORING; SYSTEM ON A CHIP (SOC);

DISLOCATIONS (CRYSTALS);

EID: 4544267757     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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