Study of crystallization and phase transformation in amorphous Co-Si thin film by X-ray diffraction

Materials Transactions

Volumn 45, Issue 7, 2004, Pages 2471-2473

  Cheng, Fanxiong ^a   Jiang, Chuanhai ^a   Wu, Jiansheng ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Cobalt silicon thin film; Crystallization; Effective heat of formation; X ray diffraction

Indexed keywords

COBALT; CRYSTALLIZATION; MAGNETRON SPUTTERING; PHASE TRANSITIONS; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION;

ELECTROMAGNETIC STIRRING; ENERGY DISPERSIVE X-RAY ANALYSIS (EDXA); ULTRALARGE SCALE INTEGRATED DEVICE (ULSI);

AMORPHOUS MATERIALS;

EID: 4544259382     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.45.2471     Document Type: Conference Paper

References (11)

1. S. P.Murarka: Intermetallics. 3 (1995) 173-186.
2. R. T. Tung, J. C. Bean, J. M. Gibdom, J. M. Poate and D. C. Jacobson: Appl. Phys. Lett. 40 (1982) 684-686.
3. M. L. A. Dass, D. B. Fraser and C.-B. Wei: Appl. Phys. Lett. 58 (1991) 1308-1310.
4. Q. Z. Hong, K. Barmak and L. A. Clevenger: J. Appl. Phys. 72 (1992) 3423-3430.
5. J. Y. Shim, S. W. Park and H. K. Baik: Thin Solid Films. 292 (1997) 31-39.
6. A. Cros, K. N. Tu, D. A. Smith and B. Z. Weiss: Appl. Phys. Lett. 52 (1986) 1311-1313.
7. B. D. Cullity: Elements Of X-Ray Diffraction, (by Addison-Wesley Publishing Company, Inc., 1978) p. 411
8. S. S. Lau, J. W. Mayer and K. N. Tu: J. Appl. Phys. 49 (1978) 4005-4010.
9. R. Pretious, A. M. Vredenberg, F. W. Sris and R. de Reus: J. Appl. Phys. 70 (1991) 3636-3646.
10. J. S. Kwak, E. J. Chi, J. D. Choi, S. W. Park, H. K. Baik, M. G. So and S. M. Lee: J. Appl. Phys. 78 (1995) 983-987.
11. S. P. Murarka and D. B. Franser: J. Appl. Phys. 51 (1980) 5380-5385.