Integrated device and process technology for sub-70nm low power DRAM

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2004, Pages 32-33

  Cho, Changhyun ^a   Song, Sangho ^a   Kim, Sangho ^a   Jang, Sungho ^a   Lee, Seongsam ^a   Kim, Hyungtak ^a   Park, Junwoong ^a   Bae, Junshik ^a   Ahn, Yongsuk ^a   Kim, Yungi ^a   Kim, Kinam ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC RESISTANCE; ETCHING; LEAKAGE CURRENTS; LITHOGRAPHY; MIM DEVICES; PROCESS ENGINEERING; SPIN COATING; TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY;

INTEGRATED DEVICES; PERIPHERAL TRANSISTORS; PLASMA NITRIDATION; PROCESS TECHNOLOGY;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 4544259175     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. Kinam Kim et.al., IEEE Trans. SM., vol.15, p. 137-143 (2002)
2. Y.K. Park et al., IEDM Tech. Dig., pp.819-822 (2002).
3. J.Y. Kim et al., Symp. on VLSI Tech., p. 11-12 (2003).
4. Se-Hoon Oh et. al., Symp. on VLSI Tech., p.73-74 (2003).