Production implementation of state-of-the-art electron beam inspection

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2004, Pages 344-347

  Ache, Alexander ^a   Wu, Kevin ^b  

^a IBM MICROELECTRONICS   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; EFFICIENCY; ELECTRIC POTENTIAL; INSPECTION; OPTIMIZATION; PARAMETER ESTIMATION; SIGNAL DETECTION;

DEFECTS OF INTEREST (DOI); ELECTRICAL MONITORING; ELECTRON BEAM INSPECTION (EBI); VOLTAGE CONTRAST (VC);

ELECTRON BEAMS;

EID: 4544240122     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)

1. M. Soucek, et al., "Electrical Line Monitoring in a 300mm Copper Fab," Semiconductor International, Vol.25, No.8, pp. 80-90. July, 2003.