Study of SiO2 modifications induced by oxygen plasmas and their effect on wet processes

ECS Transactions

Volumn 11, Issue 2, 2007, Pages 239-246

  Votta, A ^a   Bellandi, E ^a   Alessandri, M ^a   Vedda, A ^b   Ferretti, A M ^c   Fasoli, M ^b   Moretti, F ^b  

^a STMICROELECTRONICS   (Italy)

^b UNIVERSITY OF MILANO BICOCCA   (Italy)

^c LABORATORIO MDM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SPIN RESONANCE SPECTROSCOPY; OXYGEN; PARAMAGNETIC RESONANCE; POINT DEFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; SHOTCRETING; SILICA; THERMOLUMINESCENCE;

ELECTRON PARAMAGNETIC RESONANCES (EPR); OXIDE STRUCTURES; OXYGEN PLASMAS; PAPER STRUCTURE; PLASMA GENERATOR; PROCESS FLOWS; RATE PROFILES; THERMALLY STIMULATED LUMINESCENCE;

SILICON OXIDES;

EID: 45249104368     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779385     Document Type: Conference Paper

References (7)

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