Silicon nanowire fabrication using novel hydrogenation-assisted deep reactive ion etching

2007 International Semiconductor Device Research Symposium, ISDRS

Volumn , Issue , 2007, Pages

  Sammak, Amir ^a   Azimi, Soheil ^a   Mohajerzadeh, Shams ^a   Khadem Hosseini, Bahar ^a   Fallah Azad, Babak ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 44949221205     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISDRS.2007.4422497     Document Type: Conference Paper

References (1)

1. A. Sammak, "Deep Vertical Etching of Silicon Wafers Using a Hydrogenation-Assisted Reactive Ion Etching", Journal of Microelectromechanical Systems, vol. 16, no. 4, pp. 912-918, August 2007.