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Volumn 6792, Issue , 2008, Pages
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Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyond
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Author keywords
Aerial image simulation; Mask inspection; Mask repair; Phase; Phase shifting mask
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Indexed keywords
CHARGED PARTICLES;
COMPUTER NETWORKS;
DEFECTS;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON BEAMS;
ELECTRON OPTICS;
ELECTRONS;
IMAGING TECHNIQUES;
MAINTENANCE;
MEDICAL IMAGING;
MICROSCOPES;
NANOTECHNOLOGY;
OPTICAL SYSTEMS;
PARTICLE BEAMS;
PHOTOMASKS;
THREE DIMENSIONAL;
WELL STIMULATION;
(E ,3E) PROCESS;
45NM NODE;
DOUBLE EXPOSURE;
EUROPEAN;
FEATURE SIZES;
HIGH-SPATIAL-RESOLUTION;
IMMERSION LITHOGRAPHY (IML);
MASK FEATURES;
OPAQUE DEFECTS;
PHASE SHIFTING MASKS (PSM);
PHASE-SHIFTING;
PHOTOMASK REPAIR;
PRODUCTION COSTS;
REGION -OF-INTEREST (ROI);
REPAIR SYSTEMS;
SIZE AND SHAPE;
THREE-DIMENSIONAL (3D) SHAPES;
REPAIR;
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EID: 44949166459
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.798599 Document Type: Conference Paper |
Times cited : (1)
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References (4)
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