Preparation and characterization of highly L21 -ordered full-Heusler alloy Co2Fe Al0.5Si0.5 thin films for spintronics device applications

Applied Physics Letters

Volumn 92, Issue 22, 2008, Pages

  Wang, Wenhong ^a   Sukegawa, Hiroaki ^a   Shan, Rong ^a   Furubayashi, Takao ^a   Inomata, Koichiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; MAGNETIC PROPERTIES; MICROFLUIDICS;

(PL) PROPERTIES; HEUSLER ALLOYS; MAGNETIC (CE);

STRUCTURAL PROPERTIES;

EID: 44849097031     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2940595     Document Type: Article

References (20)

1. R. A. Groot, F. M. Mueller, P. G. van Engen, and K. H. J. Buschow, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.50.2024 50, 2024 (1983).
2. S. Ishida, S. Fujii, S. Kashiwagi, and S. Asano, J. Phys. Soc. Jpn. JUPSAU 0031-9015 10.1143/JPSJ.64.2152 64, 2152 (1995).
3. I. Galanakis, P. H. Dederichs, and N. Papanikolaou, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.66.174429 66, 174429 (2002).
4. S. Picozzi, A. Continenza, and A. J. Freeman, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.66.094421 66, 094421 (2002).
5. K. Inomata, S. Okamura, R. Goto, and N. Tezuka, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.42.L419 42, L419 (2003).
6. Y. Sakuraba, M. Hattori, M. Oogane, Y. Ando, H. Kato, A. Sakuma, T. Miyazaki, and H. Kubota, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2162867 88, 022503 (2006).
7. T. Ishikawa, T. Marukame, H. Kijima, K.-I. Matsuda, T. Uemura, M. Arita, and M. Yamamoto, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2378397 89, 192505 (2006).
8. T. Marukame, T. Ishikawa, S. Hakamata, K. Matsuda, T. Uemura, and M. Yamamoto, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2428412 90, 012508 (2007).
9. N. Tezuka, N. Ikeda, A. Miyazaki, S. Sugimoto, M. Kikuchi, and K. Inomata, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2354026 89, 112514 (2006).
10. G. H. Fecher and C. Felser, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 10.1088/0022-3727/40/6/S12 40, 1582 (2007).
11. Z. Gercsi and K. Hono, J. Phys.: Condens. Matter JCOMEL 0953-8984 10.1088/0953-8984/19/32/326216 19, 326216 (2007).
12. N. Tezuka, N. Ikeda, S. Sugimoto, and K. Inomata, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.46.L454 46, L454 (2007).
13. P. J. Webster, J. Phys. Chem. Solids JPCSAW 0022-3697 32, 0221 (1970).
14. T. M. Nakatani, A. Rajanikanth, Z. Gercsi, Y. K. Takahashi, K. Inomata, and K. Hono, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2767229 102, 033916 (2007).
15. T. Ambrose, J. J. Krebs, and G. A. Prinz, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.126606 76, 3280 (2000).
16. J. W. Dong, L. C. Chen, C. J. Palmstrøm, R. D. James, and S. McKernan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1334356 77, 4190 (2000).
17. J. Lu, J. W. Dong, J. Q. Xie, S. McKernan, C. J. Palmstrøm, and Y. Xin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1612900 83, 2393 (2003).
18. W. H. Wang, M. Przybylski, W. Kuch, L. I. Chelaru, J. Wang, Y. F. Lu, J. Barthel, H. L. Meyerheim, and J. Kirschner, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.71.144416 71, 144416 (2005).
19. Y. B. Xu, E. T. Kernoham, D. J. Freeland, A. Ercole, M. Tselepi, and J. A. C. Bland, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.58.890 58, 890 (1998).
20. B. Balke, H. Fecher, and C. Felser, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2748341 90, 242503 (2007).