Progress in orientation-patterned GaAs for next-generation nonlinear optical devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6875, Issue , 2008, Pages

  Peterson, Rita D ^a   Bliss, David ^a   Lynch, Candace ^a   Tomich, David H ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

GaAs epitaxy; Nonlinear optical frequency conversion; Optical parametric amplification; Orientation patterning; Quasi phase matching

Indexed keywords

(1 1 1) ORIENTATION; (OTDR) TECHNOLOGY; (PL) PROPERTIES; DEVICE CHARACTERIZATION; FREQUENCY CONVERSIONS; GROWTH CONDITIONS; INDUSTRIAL PROCESSING; LOSS MECHANISMS; MATE RIAL PROPERTIES; MATERIAL QUALITY; MATERIAL UNIFORMITY; NON LINEAR OPTICAL (NLO) MATERIALS; NON-LINEAR OPTICAL DEVICES; NONLINEAR FREQUENCY; OPTICAL (PET) (OPET); PERFORMANCE MEASUREMENT (QUALITY); SAMPLE THICKNESS; SPECTRAL REGIONS;

COMPUTER NETWORKS; GALLIUM ALLOYS; INDUSTRIAL ECONOMICS; INDUSTRIAL MANAGEMENT; INDUSTRIAL RESEARCH; MATERIALS PROPERTIES; MOLECULAR BEAM EPITAXY; MULTITASKING; NONLINEAR PROGRAMMING; OPTICAL LOSSES; OPTICAL MATERIALS; PIGMENTS; SEMICONDUCTING GALLIUM; TECHNOLOGY; WAFER BONDING;

OPTICAL FREQUENCY CONVERSION;

EID: 44849086040     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.766581     Document Type: Conference Paper

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