Characterization of a stoichiometric SiC film deposited on a thermally oxidized Si substrate

Journal of Alloys and Compounds

Volumn 461, Issue 1-2, 2008, Pages

  Yi, J ^a   He, X D ^a   Sun, Y ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Composition fluctuations; Thin films; Vapor deposition

Indexed keywords

EID: 44649099516     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2007.07.042     Document Type: Letter

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