Structural changes during vapor-phase deposition of polycrystalline-PbI2 films

Journal of Crystal Growth

Volumn 310, Issue 13, 2008, Pages 3168-3173

  Schieber, M ^a,b   Zamoshchik, N ^a   Khakhan, O ^a   Zuck, A ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

^b Real Time Radiography   (Israel)

Author keywords

A3. Physical vapor deposition; A3. Polycrystalline deposition; B2. Semiconducting lead compounds

Indexed keywords

COATINGS; DEPOSITION; ELECTROCHEMICAL ELECTRODES; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; VAPORS; X RAY DIFFRACTION;

COATING MATERIALS; STRUCTURAL CHANGES; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE;

THIN FILMS;

EID: 44549083744     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.02.030     Document Type: Article

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