Hydrogen absorption in 3.1 nanometre sized palladium samples: Does structure matter?

International Journal of Materials Research

Volumn 99, Issue 5, 2008, Pages 528-534

  Suleiman, Mohammed ^a   Fritsch, Detlev ^b   Borchers, Christine ^a   Guerdane, Mohamed ^a   Pundt, Astrid ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

Clusters; Nanostructures; Polymers; Synchrotron radiation; X ray diffraction

Indexed keywords

HYDROGEN; PALLADIUM; PHASE TRANSITIONS; SYNCHROTRON RADIATION; X RAY DIFFRACTION;

HYDROGEN ABSORPTION; ICOSAHEDRAL CLUSTERS;

GAS ABSORPTION;

EID: 44449160334     PISSN: 18625282     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.101670     Document Type: Article

References (24)

1. H. Haberland (Ed.): Clusters of atoms and molecules, Springer-Verlag Berlin Heidelberg 1994.
2. M. Suleiman, J. Faupel, C. Borchers, H.-U Krebs, R. Kirchheim, A. Pundt: J. Alloys Compd. 404-406 (2005) 523.
3. M. Suleiman, N.M. Jisrawi, O. Dankert, M.T. Reetz, C. Bähtz, R. Kirchheim, A. Pundt: J. Alloys Compd. 356-357 (2003) 644.
4. N. Jisrawi, M. Dornheim, H. Teichler, H. Ehrenberg, M.T. Reetz, A. Pundt: unpublished results.
5. J.M. Rowe, J.J. Rush, L.A. de Graaf, G.A. Ferguson: Phys. Rew. Lett. 79 (1979) 1250.
6. F. Calvo, A. Carré: Nanotechnology 17 (2006) 1292.
7. A. Pundt, M. Dornheim, H. Guerdane, H. Teichler, H. Ehrenberg, M.T. Reetz, N.M. Jisrawi: Eur. Phys. J. D 19 (2002) 333.
8. C. Sachs, A. Pundt, R. Kircheim, M.T. Reetz, D. Fritsch: Phys. Rev. B 64 (2001) 75408.
9. C. Nützenadel, A. Zütel, D. Chartouni, G. Schmid, L. Schlapbach: Eur. Phys. J. D. 8 (2000) 245.
10. M. Yamauchi, H. Kitagawa: Synth. Metals 153 (2005) 353.
11. S. Kishore, J.A. Nelson, J.H. Adair, P.C. Eklund: J. Alloys Compd. 389 (2005) 234.
12. C. Kuhrt, R. Anton: Thin Solid Films 198 (1991) 213.
13. M.T. Reetz, W. Helberg: J. Am. Chem. Soc. 116 (1994) 7401.
14. D. Fritsch, G. Bengtson: unpublished results.
15. A. Prange: Spectr. 44 (1989) 437-452.
16. B.D. Hall, D. Zanchet, D. Ugarte: J. Appl. Cryst. 33 (2000) 1335.
17. M. Suleiman, C. Borchers, M. Guerdane, N.M. Jisrawi, M.T. Reetz, R. Kirchheim, H. Teichler, A. Pundt: DPG 2005 abstract number (MM19.4).
18. M. Suleiman, R. Kirchheim, A. Pundt: unpublished results.
19. R. Kirchheim: Prog. Mat. Sci. 32 (1988) 262.
20. E. Wicke, H. Brodowski, in: G. Alferd, V. Voekl (Eds.), Hydrogen in Metal II, Springer-Verlag Berlin Heidelberg 1978.
21. S. Horinouchi, Y. Yamanoi, T. Yonezawa, T. Mouri, H. Nishihara: Langmuir 22 (4) (2006) 1880.
22. X. Fu, Y. Wang, N. Wu, L. Gui, Y. Tang: J. Colloid. Interf. Sci. 243 (2001) 326.
23. R. Tannenbaum, M. Zubris, K. David, D. Ciprari, K. Jacob, I. Jasiuk, N. Dan: J. Phy. Chem. B 110 (2006) 2227.
24. http://www2.dupont.com/Teflon_Industrial/en_US/products/pro-duct_by_name/ teflon_af/properties.html