The interdiffusion and solid-state reaction of low-energy copper ions implanted in silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 11, 2008, Pages 2572-2575

  Gao, Xing Xin ^a   Li, Tian Jing ^a   Li, Gong Ping ^a   Cao, Bo ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Interdiffusion; Interfacial reaction; Ion implantation; RBS; Silicide; XRD

Indexed keywords

DIFFUSION; REACTION KINETICS; SURFACE CHEMISTRY; X RAY DIFFRACTION ANALYSIS;

INTERDIFFUSION; INTERFACIAL REACTION;

SILICIDES;

EID: 44449093105     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.03.082     Document Type: Article

References (25)

1. Arnold G.W., and Border J.A. J. Appl. Phys. 48 (1977) 1488
2. Haglund Jr. R.F., Li Y., Magruder R.H., White C.W., Zuhr R.A., Yang L., Dorsinville R., and Alfano R.R. Nucl. Instr. and Meth. B 91 (1994) 493
3. Haglund Jr. R.F., Yang L., Magruder III R.H., Wittig J.E., Becker K., and Zuhr R.A. Opt. Lett. 18 (1993) 373
4. Murarka SP. Silicides for VKSI Applications (1983), Academic Press, New York
5. Rossi G. Surf. Sci. Rep. 7 (1987) 1
6. Abbati I., and Grioni M. J. Vac. Sci. Technol. 19 (1981) 631
7. Kendelewicz T., Rossi G., Petro W.G., Babalols I.A., Lindau I., and Spicer W.E. J. Vac. Sci. Technol. B 1 (1983) 564
8. Rossi G., Kendelewicz T., Lindau I., and Spicer W.E. J. Vac. Sci. Technol. A 1 (1983) 987
9. Rossi G., and Lindau I. Phys. Rev. B 28 (1983) 3597
10. Chambers S.A., Howell G.A., Greenlee T.R., and Weaver J.H. Phys. Rev. B 31 (1985) 6402
11. Daugy E., Mathiez P., Salvan F., and Layet J.M. Surf. Sci. 154 (1985) 267
12. Nakahara T., Ohkura S., Shoji F., Hanawa T., and Oura K. Nucl. Instr. and Meth. B 45 (1990) 467
13. Nakamur M., and Susama M. J. Appl. Phys. 94 (2003) 3075
14. Sinke C., and Saris F. Phys. Rev Lett. 53 (1984) 2121
15. Chu WK., Mayer JW., and Nicolet MA. Backscattering Spectrometry (1978), New York, San Francisco, London, Academic Press
16. Ziegler J.F., Biersack J.P., and Littmark U. The Stopping and Range of Ions in Solids (1985), Pergamon Press, New York Chapter 8
17. Cao B., Bao L.-m., Li G.-p., and He S.-h. Acta Phys. Sin. 55 (2006) 6550
18. Benouattas N., Mosser A., Raiser D., Faerber J., and Bouabellou A. Appl. Surf. Sci. 153 (2000) 79
19. Sekar K., Satyam P.V., Kuri G., Mahapatra D.P., and Dev B.N. Nucl. Instr. and Meth. B 73 (1993) 63
20. Chang C.A. J. Appl. Phys. 67 (1990) 566
21. Stolt L., and Dheurle F.M. Thin solid films 189 (1990) 269
22. Cros A., Aboelfotoh M.O., and Tu K.N. J. Appl. Phys. 67 (1990) 3328
23. Chromik R.R. J. Appl. Phys. 86 8 (1999) 4273
24. Massalski T.B. Binary Alloy Phase Diagrams. 2nd ed. (1990), ASM International Materials Park, OH p. 1477
25. E. S. Microware, Inc.