Programmable self-aligning ferrofluid masks for lithographic applications

IEEE Transactions on Magnetics

Volumn 40, Issue 4 II, 2004, Pages 2994-2996

  Yellen, B B ^a   Friedman, G ^a   Barbee, K A ^b  

^a Drexel University   (United States)

^b DREXEL UNIVERSITY   (United States)

Author keywords

Ferrofluid; Magnetism; Masking; Maskless lithography; Photolithography; Self aligning; Self assembly

Indexed keywords

DIFFUSION; FERROMAGNETIC MATERIALS; MAGNETIC FIELDS; MAGNETISM; MAGNETIZATION; MAGNETS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SURFACE CHEMISTRY;

FERROFLUIDS; MASKING; MASKLESS LITHOGRAPHY; SELF-ALIGNING;

MASKS;

EID: 4444369820     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2004.829836     Document Type: Article

References (8)

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