메뉴 건너뛰기




Volumn 25, Issue 9, 2004, Pages 643-645

A novel erase scheme to suppress overerasure in a scaled 2-bit nitride storage flash memory cell

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR ARRAYS; DIELECTRIC MATERIALS; ELECTRIC CHARGE; FLASH MEMORY; GATES (TRANSISTOR); HOLE TRAPS; LEAKAGE CURRENTS; SEMICONDUCTOR JUNCTIONS; THRESHOLD VOLTAGE;

EID: 4444348629     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.833596     Document Type: Article
Times cited : (7)

References (13)
  • 2
    • 0034250576 scopus 로고    scopus 로고
    • High performance SONOS memory cells free of drain turn-on and over-erase: Compatibility issue with current Flash technology
    • Aug
    • M. K. Cho and D. M. Kim, "High performance SONOS memory cells free of drain turn-on and over-erase: Compatibility issue with current Flash technology," IEEE Electron Device Lett., vol. 21, pp. 399-401, Aug. 2000.
    • (2000) IEEE Electron Device Lett. , vol.21 , pp. 399-401
    • Cho, M.K.1    Kim, D.M.2
  • 4
    • 4444354828 scopus 로고    scopus 로고
    • Reliability models of data retention and read-disturb in 2-bit nitride storage Flash memory cells (Invited)
    • T. Wang, W. J. Tsai, S. H. Gu, C. T. Chan, C. C. Yeh, N. K. Zous, T. C. Lu, S. Pan, and C. Y. Lu, "Reliability models of data retention and read-disturb in 2-bit nitride storage Flash memory cells (Invited ," in IEDM Tech. Dig., 2003, pp. 7.4.1-7.4.4.
    • (2003) IEDM Tech. Dig.
    • Wang, T.1    Tsai, W.J.2    Gu, S.H.3    Chan, C.T.4    Yeh, C.C.5    Zous, N.K.6    Lu, T.C.7    Pan, S.8    Lu, C.Y.9
  • 7
    • 0036081965 scopus 로고    scopus 로고
    • Cause of data retention loss in a nitride-based localized trapping storage flash memory cell
    • W. J. Tsai, S. H. Gu, N. K. Zous, C. C. Yeh, C. C. Liu, C. H. Chen, T. Wang, S. Pan, and C. Y. Lu, "Cause of data retention loss in a nitride-based localized trapping storage Flash memory cell," in Proc. IRPS, 2001, pp. 34-38.
    • (2001) Proc. IRPS , pp. 34-38
    • Tsai, W.J.1    Gu, S.H.2    Zous, N.K.3    Yeh, C.C.4    Liu, C.C.5    Chen, C.H.6    Wang, T.7    Pan, S.8    Lu, C.Y.9
  • 8
    • 0032000289 scopus 로고    scopus 로고
    • Direct lateral profiling of hot-carrier induced oxide charge and interface traps in thin MOSFETs
    • Feb
    • C. Chen and T. P. Ma, "Direct lateral profiling of hot-carrier induced oxide charge and interface traps in thin MOSFETs," IEEE Trans. Electron Devices, vol. 45, p. 512, Feb. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 512
    • Chen, C.1    Ma, T.P.2
  • 10
    • 0020943292 scopus 로고
    • New EPROM data-loss mechanisms
    • N. R. Mielke, "New EPROM data-loss mechanisms," in Proc. IRPS, 1983, pp. 106-113.
    • (1983) Proc. IRPS , pp. 106-113
    • Mielke, N.R.1
  • 11
    • 0025577333 scopus 로고
    • Charge loss in EPROM due to ion generation and transport in interlevel dieletric
    • G. Crisenza, G. Ghidini, S. Manzini, A. Modelli, and M. Tosi, "Charge loss in EPROM due to ion generation and transport in interlevel dieletric," in IEDM Tech. Dig., 1990, pp. 107-110.
    • (1990) IEDM Tech. Dig. , pp. 107-110
    • Crisenza, G.1    Ghidini, G.2    Manzini, S.3    Modelli, A.4    Tosi, M.5
  • 13
    • 0035471793 scopus 로고    scopus 로고
    • Lateral profiling of interface traps and oxide charge in MOSFET devices: Charge pumping versus DCIV
    • Oct
    • M. Martirosian and T. P. Ma, "Lateral profiling of interface traps and oxide charge in MOSFET devices: Charge pumping versus DCIV," IEEE Trans. Electron Devices, vol. 48, pp. 2303-2309, Oct. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 2303-2309
    • Martirosian, M.1    Ma, T.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.