Porous a/nc-Si:H films produced by HW-CVD as ethanol vapour detector and primary fuel cell

Sensors and Actuators, B: Chemical

Volumn 103, Issue 1-2, 2004, Pages 344-349

  Ferreira, Isabel ^a   Igreja, Rui ^a   Fortunato, Elvira ^a   Martins, Rodrigo ^a  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

Author keywords

Ethanol detector; HW CVD technique; Porous silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC IMPEDANCE; ETHANOL; FUEL CELLS; HYDROGEN; MICROSTRUCTURE; MOISTURE; POROUS SILICON; VAPOR PRESSURE;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HW-CVD); POROUS SILICON (PS); SPECTROSCOPIC IMPEDANCE; VAPOR MOISTURE;

THIN FILMS;

EID: 4444347784     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2004.04.064     Document Type: Conference Paper

References (11)

1. th UK Conference on Sensors and their Applications, Southampton, UK, 13-16 September 1998, vol. 1, Institute of Physics Publishing, Bristol and Philadelphia, pp. 544-547.
2. G. Barillaro, A. Diligenti, A. Nannini, F. Pieri, Eurosensors XIV, 27-30 August 2000, Copenhagen, Denmark, M2P39.
3. Heiland G. Sens. Actuators. 2:1982;343
4. R.B. Vasiliev, L.I. Raybova, M.N. Rumyantseva, A.M. Gaskov, Eurosensors XIV, 27-30 August 2000, Copenhagen, Denmark, T1s2.
5. Ferreira I., Fernandes B., Martins R. Vacuum. 52:1999;147; Ferreira I., Cabrita A., Braz Fernandes F., Fortunato E., Martins R. Vacuum. 64:2001;237
6. Ferreira I., Fernandes B., Martins R. Vacuum. 52:1999;147; Ferreira I., Cabrita A., Braz Fernandes F., Fortunato E., Martins R. Vacuum. 64:2001;237
7. Kocka J., Stuchlikova H., Stuchlik J., Rezek B., Svrcek V., Fojtik P., Pelant I., Fejfar A. Solid State Phenomena. 80-81:2001;213-224
8. Ferreira I., Fortunato E., Martins R. Mater. Res. Soc. Symp. Proc. 664:2001;A26.7
9. Cole K.S., Cole R.H. J. Chem. Phys. 9:1941;421
10. Roy Morrison S. Sens. Actuators. 2:1982;329
11. Kanschat P., Lips K., Bruggemann R., Heirzenberger A., Sieber I., Fuhs W. Mater. Res. Soc. Symp. Proc. 505:1998;793