Investigation of the metal-oxide buried interfacial zone with linear sweep voltammetry

Journal of Applied Electrochemistry

Volumn 34, Issue 9, 2004, Pages 919-927

  Cocke, D L ^a   Mencer, D E ^b   Hossain, M A ^a   Schennach, R ^c   Kesmez, M ^a   Parga, J R ^d   Naugle, D G ^e  

^a LAMAR UNIVERSITY   (United States)

^b WILKES UNIVERSITY   (United States)

^c GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^d INSTITUTO TECNOLÓGICO DE SALTILLO   (Mexico)

^e TEXAS A AND M UNIVERSITY   (United States)

Author keywords

Copper; Cu2O; Cu3O2; CuxO; CuO; Linear sweep voltammetry; Modified cabrera and mott (C M) model; Oxide decomposition; Oxygen diffusion

Indexed keywords

CU2O; CU3O2; CUO; CUXO; LINEAR SWEEP VOLTAMMETRY (LSV); MODIFIED CABRERA AND MOTT (C-M) MODEL; OXIDE DECOMPOSITION; OXYGEN DIFFUSION;

CYCLIC VOLTAMMETRY; DECOMPOSITION; DEFECTS; DESORPTION; DIFFUSION; ELECTROCHEMISTRY; METALLIC FILMS; MULTILAYERS; OXIDATION; POSITIVE IONS; THERMAL EFFECTS; THIN FILMS;

COPPER OXIDES;

EID: 4444261707     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JACH.0000040496.10467.5b     Document Type: Article

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