Ruthenium bipyridyl complex-sensitized dechlorination of CCl4 in aqueous micellar solutions under visible light

Journal of Industrial and Engineering Chemistry

Volumn 14, Issue 3, 2008, Pages 315-321

  Cho, Youngmin ^a   Park, Yiseul ^b   Choi, Wonyong ^b  

^a Korea Railroad Research Institute   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Brij; CCl4; Dechlorination; Photolysis; Ruthenium complex; Surfactant

Indexed keywords

EID: 44349188747     PISSN: 1226086X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jiec.2008.01.003     Document Type: Article

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